TP Anhydrous HF

Overcoming Hydrogen-Bonding in On-line Spectroscopy of Hydrofluoric Acid Paul G. Vahey, Honeywell Jorge E. Perez, CIC Photonics, Inc. PDF Version
Measure ppm Impurities On-line in HF
	Benefits Reduce - Grab Sampling, Exposure Improve - Turnaround, Precision, Process Control Challenges Materials Compatibility Unusual properties of HF Could not reproduce in laboratory Lab Instrument in plant environment Enablers Quality people at Plant, Vendors, Engineering, Lab
Experimental Conditions
	Sampling Anhydrous HF Heat Tracing at 105°F Manifold with By-Pass and N2 Purge Dynamic and Stop flow capabilities Safety Shut-off at several points Instrumentation IRGAS 100 Demo unit 20 cm direct pass detection cell independent heating control IRGAS software
Ideal FTIR Spectrum of HF Gas Severe Hydrogen Bonding IRGAS Demo Instrument with Manifold Demo Instrument, Heat Traced and Insulated Strategies for Reducing Saturation Pressure
	1. Reduce Total Pressure of Sample Condensation / Heat of Expansion Decrease Sensitivity 2. Dilute with Inert Gas Same as above Not Robust for Manufacturing Process 3. Increase Temperature Simple Maintain Sensitivity Material Compatibility
Apparent Molecular Weight of HF vs. P, Available on http://www.HFacid.com Hydrogen Bonding Reduced by Dilution Zoom in on Dilution Eliminate Hydrogen Bonds by Heating Ideal FTIR Spectrum of HF Gas Dilution vs Heating Compare Lab and FTIR Results for SO LessonsLearned for Trace Analysis in HF Lessons Learned for Trace Analysis in HF
	Safety Safety Safety Shut-offs, check valves, PPE Alarms for Low-flow & High pressure Materials Compatibility Sampling Heat >> Dilution for Reducing H-bonding Materials Compatibility Manifold improved flexibility Instrumentation IRGAS system is robust >20 cm pathlength detection cell
Acknowledgements
	Honeywell Hydrofluoric Acid Plant Bill Pepe, Dana Smith, John McCarthy, Bruce Perque Jason Landry, Cheryl Smith, Jonathan Hulgan Operators, I&E Technicians (Scott Guillory) Honeywell Analytical Scientists John Welch, Rob Bray, Ralph Borowski CIC Photonics Jorge Perez Dick Meyer, John Derrig

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